| Title: |
Redundant via insertion for multiple-patterning directed-self-assembly lithography |
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| Authors: |
Seongbo Shim |
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KAIST, School of Electrical Engineering
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| Woohyun Chung |
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KAIST, School of Electrical Engineering
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| Youngsoo Shin |
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KAIST, School of Electrical Engineering
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| Sharing: |
Unknown
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| Verification: |
Authors have
not verified
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| Artifact Evaluation Badge: |
none
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| NSF Award Numbers: |
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| DBLP Key: |
conf/dac/ShimCS16
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| Author Comments: |
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